Tainan, Taiwan

Pei Yen Cheng

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pei Yen Cheng. Retrieved from https://idiyas.com/inventor/pei-yen-cheng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Pei Yen Cheng - Innovator in Semiconductor Manufacturing

Introduction

Pei Yen Cheng is a talented inventor based in Tainan City, Taiwan. She has made significant contributions to the field of semiconductor manufacturing through her innovative ideas and patent applications. Although she currently holds no granted patents, her work demonstrates a commitment to advancing technology in this critical industry.

Latest Patent Applications

Pei Yen Cheng's latest patent applications include the following:

1. **Adjustable Nozzle Device** - This application discloses an apparatus and method for semiconductor manufacturing processes. The apparatus includes a wafer holder designed to hold a wafer, a nozzle positioned above the wafer to provide material, and a nozzle control device that adjusts the nozzle's configuration to enhance the uniformity of the material applied to the wafer. The method involves loading the wafer into a chamber, feeding material through the nozzle, measuring the thickness profile of the material on the wafer, and adjusting the nozzle configuration based on this profile.

2. **Methods Of Forming Contact Structure In Semiconductor Devices** - This application describes a semiconductor device and a method for its fabrication. The method includes forming a fin base on a substrate, epitaxially growing a source/drain (S/D) region on the fin base, creating a contact opening on the S/D region, and forming a semiconductor nitride layer on the sidewall of the contact opening. It also involves performing a densification process on the nitride layer, forming a silicide layer on the exposed surface of the S/D region, creating a contact plug in the opening, and establishing a via structure in the contact plug.

Conclusion

Pei Yen Cheng is an innovative inventor whose work in semiconductor manufacturing showcases her dedication to improving technology in this field. Her latest patent applications reflect her expertise and potential for future contributions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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