Pei-Ling Kao

Title: Pei-Ling Kao: Innovator in Semiconductor Technology

Introduction

Pei-Ling Kao is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to enhancing semiconductor structures.

Latest Patents

Pei-Ling Kao's latest patents include a method for multi-gate transistor channel height adjustment. This method involves providing a semiconductor substrate with distinct regions, epitaxially growing a semiconductor layer, and patterning it to form fins. The process also includes an anneal step to drive dopants into a dielectric material layer, ensuring varying dopant concentrations across regions. His second patent focuses on a method for forming a semiconductor structure, which includes creating a stack of alternating semiconductor layers, forming a polishing stop layer, and patterning the structure into fin configurations.

Career Highlights

Pei-Ling Kao is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor fabrication techniques, contributing to the efficiency and performance of electronic devices.

Collaborations

Pei-Ling has collaborated with notable colleagues, including You-Ting Lin and Jiun-Ming Kuo, who have also contributed to the innovative projects within their field.

Conclusion

Pei-Ling Kao's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as a key innovator in the industry. His advancements continue to influence the development of modern electronic devices.