Pei-I Wang

Title: Pei-I Wang: Innovator in Semiconductor Technology

Introduction

Pei-I Wang is a notable inventor based in Troy, NY, who has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Wang's work focuses on the development of advanced materials that enhance the performance and reliability of semiconductor devices.

Latest Patents

Wang's latest patents include innovative solutions such as siloxane epoxy polymers as metal diffusion barriers to reduce electromigration. These structures employ siloxane epoxy polymers adjacent to conductive metal layers, providing excellent adhesion to metals like copper and significantly increasing the electromigration lifetime of metal lines. Additionally, his patent on siloxane epoxy polymers for low-k dielectric applications highlights their use in semiconductor devices. These polymers not only adhere well to metals but also exhibit dielectric constants as low as 1.8, offering superior performance compared to conventional dielectric materials. Furthermore, these dielectrics are fully curable at low temperatures, exhibit low leakage currents, and remain stable at temperatures exceeding 400°C, making them particularly attractive for the semiconductor industry.

Career Highlights

Throughout his career, Pei-I Wang has worked with reputable organizations such as Polyset Company, Inc. and Rensselaer Polytechnic Institute. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor technology.

Collaborations