The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Apr. 27, 2004
Pei-i Wang, Troy, NY (US);
Toh-ming LU, Loudonville, NY (US);
Shyam P. Murarka, Clifton Park, NY (US);
Ramkrishna Ghoshal, Clifton Park, NY (US);
Pei-I Wang, Troy, NY (US);
Toh-Ming Lu, Loudonville, NY (US);
Shyam P. Murarka, Clifton Park, NY (US);
Ramkrishna Ghoshal, Clifton Park, NY (US);
Polyset Company, Inc., Mechanicville, NY (US);
Rensselaer Polytechnic Institute, Troy, NY (US);
Abstract
Structures employing siloxane epoxy polymers as diffusion barriers adjacent conductive metal layers are disclosed. The siloxane epoxy polymers exhibit excellent adhesion to conductive metals, such as copper, and provide an increase in the electromigration lifetime of metal lines. In addition, the siloxane epoxy polymers have dielectric constants less then 3, and thus, provide improved performance over conventional diffusion barriers.