Company Filing History:
Years Active: 2006-2023
Title: Pei-Chun Chiang: Innovator in Defect Detection Technologies
Introduction
Pei-Chun Chiang is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of defect detection technologies. With a total of 2 patents, her work focuses on improving the efficiency and accuracy of mask inspection processes in semiconductor manufacturing.
Latest Patents
One of her latest patents is titled "Defect detection for multi-die masks." This patent describes methods and systems for detecting defects on a mask. The process includes generating a database reference image for a multi-die mask through simulation and detecting initial defects by comparing this reference image to images generated by an imaging subsystem for the first die. Additionally, the method involves creating a die reference image for the first die by applying parameters learned from the database reference image to images of other dies. Another significant patent is "Multiple design database layer inspection." This patent outlines techniques that utilize design databases during the construction of phase shift masks. It describes rendering a model or reference image that accounts for systematic variations and comparing it to an optically acquired image to identify defects. This technique is efficient as it inspects all layers in one pass.
Career Highlights
Pei-Chun has worked with prominent companies in the industry, including KLA-Tencor Technologies Corporation and KLA Corporation. Her experience in these organizations has allowed her to develop and refine her innovative approaches to defect detection.
Collaborations
Throughout her career, Pei-Chun has collaborated with esteemed colleagues such as Mark Joseph Wihl and George Q. Chen. These partnerships have contributed to her success and the advancement of her inventions.
Conclusion
Pei-Chun Chiang is a pioneering inventor whose work in defect detection technologies has made a significant impact on the semiconductor industry. Her innovative patents and collaborations highlight her dedication to improving manufacturing processes.