Pavel Ivanovich Nagornykh

Title: Pavel Ivanovich Nagornykh: Innovator in Metrology Systems

Introduction

Pavel Ivanovich Nagornykh is a notable inventor based in Kirkland, WA (US), recognized for his contributions to metrology systems. With a total of four patents to his name, Nagornykh has made significant advancements in the field of precision measurement technologies.

Latest Patents

Nagornykh's latest patents include a metrology system utilizing points-from-focus type processes with glare reduction. This innovative system features a lighting configuration and camera that work together to acquire image stacks of a workpiece. Each image stack is captured using different lighting positions, allowing for the determination of a composite stack of pixel intensity values. This process includes glare reduction techniques to enhance measurement accuracy. Another notable patent is a metrology system configured to illuminate and measure apertures of workpieces. This system incorporates front and back vision components, enabling precise imaging and measurement of workpiece features through a sophisticated alignment mechanism.

Career Highlights

Pavel Nagornykh is currently employed at Mitutoyo Corporation, a leading company in precision measurement instruments. His work at Mitutoyo has allowed him to apply his innovative ideas and contribute to the development of advanced metrology solutions.

Collaborations

Nagornykh has collaborated with esteemed colleagues such as Paul Gerard Gladnick and Christopher Richard Hamner. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Pavel Ivanovich Nagornykh stands out as a prominent inventor in the field of metrology systems, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the future of precision measurement technologies.