The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
May. 25, 2023
Mitutoyo Corporation, Kanagawa-ken, JP;
Paul Gerard Gladnick, Seattle, WA (US);
Christopher Richard Hamner, Kirkland, WA (US);
Pavel Ivanovich Nagornykh, Kirkland, WA (US);
Mitutoyo Corporation, Kanagawa-ken, JP;
Abstract
A metrology system includes front and back vision components portions, and is configured to have a workpiece positioned between the two portions. The back vision components portion includes a light source and a diffuser. The front vision components portion includes a variable focal length lens, an objective lens and a camera. The metrology system includes a movement mechanism portion configured to align relative positions between the front and back vision components portions and an aperture defined through the workpiece such that at least a portion of the light from the light source that passes through the diffuser passes through the aperture for providing the illumination for imaging the aperture. The camera acquires an image stack of images of the aperture at different focus positions. Based on an analysis of the image stack, measurements related to workpiece features of the aperture (e.g., including a distance between workpiece features) can be determined.