logo

For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Pavel Ionov

This inventor holds 10 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pavel Ionov. Retrieved from https://idiyas.com/inventor/pavel-ionov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 70.0

Average Co-Inventor Count = 3.6

ph-index = 8

Forward Citations = 794(Granted Patents)


Location History:

  • Glendale, CA (US) (2003)
  • Sunnyvale, CA (US) (2000 - 2008)

Company Filing History:

goldMedal10 out of 14,433 
 
Applied Materials, Inc.
 patents

Years Active: 2000-2008

Loading Chart...
10 patents (USPTO):Explore Patents
1. 7399707 - In situ application of etch back for improved deposition into high-aspect-ratio features (2008-07-15),
2. 6869880 - In situ application of etch back for improved deposition into high-aspect-ratio features (2005-03-22),
3. 6581612 - Chamber cleaning with fluorides of iodine (2003-06-24),
4. 6537918 - Method for etching silicon oxynitride and dielectric antireflection coatings (2003-03-25),
5. 6458516 - Method of etching dielectric layers using a removable hardmask (2002-10-01),
6. 6331380 - Method of pattern etching a low K dielectric layer (2001-12-18),
7. 6291356 - Method for etching silicon oxynitride and dielectric antireflection coatings (2001-09-18),
8. 6080529 - Method of etching patterned layers useful as masking during subsequent (2000-06-27),
9. 6013582 - Method for etching silicon oxynitride and inorganic antireflection (2000-01-11),
10. 6010966 - Hydrocarbon gases for anisotropic etching of metal-containing layers (2000-01-04),

Title: Pavel Ionov: Innovator in Plasma Processing Technology

Introduction

Pavel Ionov is a distinguished inventor based in Sunnyvale, California, known for his significant contributions to plasma processing technology. With a total of 10 patents to his name, he has made remarkable advancements in the field of semiconductor manufacturing.

Latest Patents

One of his latest patents focuses on the in situ application of etch back for improved deposition into high-aspect-ratio features. This innovative process involves a continuous sequence of deposition, etching, and deposition, which is utilized for forming a film on a substrate using a plasma process. Notably, the etch-back can be performed without separate plasma activation of the etchant gas. This method allows for the effective filling of features with high aspect ratios while ensuring improved uniformity throughout the process.

Career Highlights

Pavel Ionov has built a successful career at Applied Materials, Inc., where he has been instrumental in developing cutting-edge technologies that enhance semiconductor fabrication processes. His expertise in plasma processes has positioned him as a key player in the industry.

Collaborations

Throughout his career, Pavel has collaborated with talented professionals, including Chun Yan and Yan Ye, contributing to various innovative projects and advancements in technology.

Conclusion

Pavel Ionov's work in plasma processing technology exemplifies the spirit of innovation and dedication to improving semiconductor manufacturing. His patents and contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…