The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Apr. 17, 2001
Applicant:
Inventors:
Peter Loewenhardt, Pleasanton, CA (US);
Shamouil Shamouilian, San Jose, CA (US);
Pavel Ionov, Glendale, CA (US);
Pamanabhan Krishnaraj, San Francisco, CA (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 ;
U.S. Cl.
CPC ...
B08B 7/00 ;
Abstract
A method of cleaning a semiconductor processing chamber uses as a cleaning gas precursor an iodine fluoride such as IF and IF . Reactive species are generated from the precursor with help of plasma. These reactive species are further used to clean the processing chamber.
Loewenhardt, Peter. (2003). Chamber cleaning with fluorides of iodine (U.S. Patent No. 6581612). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6581612
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile