Grenoble, France

Paulo Eduardo Lima

This inventor holds 1 USPTO granted patent. Top assignee: Aviza Technology Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paulo Eduardo Lima. Retrieved from https://idiyas.com/inventor/paulo-eduardo-lima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Paulo Eduardo Lima: Innovator in Plasma Technology

Introduction

Paulo Eduardo Lima is a notable inventor based in Grenoble, France. He has made significant contributions to the field of plasma technology, particularly through his innovative patent related to plasma sources. His work has implications for various applications in science and industry.

Latest Patents

Lima holds a patent for a plasma source that utilizes a plasma generator, an antenna, and an RF source. The generated plasma flows into a chamber, where ions are accelerated out by a grid. A body is strategically located within the volume to create local losses, thereby reducing local plasma density. This invention showcases his expertise in developing advanced plasma technologies.

Career Highlights

Paulo Eduardo Lima is associated with Aviza Technology Limited, where he continues to push the boundaries of plasma technology. His work at the company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Lima has worked alongside notable colleagues such as Gary Proudfoot and Christopher David George. Their combined efforts contribute to the advancement of innovative technologies in their respective areas of expertise.

Conclusion

Paulo Eduardo Lima is a distinguished inventor whose work in plasma technology has led to valuable advancements in the field. His patent and collaborations reflect his commitment to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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