This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2008-2013.
Location History:
- Hsinchu, TW (2008)
- Hsinchu County, TW (2013)
Company Filing History:
Years Active: 2008-2013
Title: Paul Tan - Innovator in Slurry Supply and Dispensing Systems
Introduction
Paul Tan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of slurry supply and dispensing systems, holding a total of 2 patents. His innovative designs have enhanced the efficiency and functionality of chemical mechanical polishing processes.
Latest Patents
Tan's latest patents include a slurry supply system and a slurry dispensing system. The slurry supply system features multiple supply modules and a flushing module that work concurrently. Each supply module is equipped with a slurry reservoir and delivery lines directed toward a chemical mechanical polishing apparatus. The flushing module contains a flushing liquid reservoir and multiple flushing lines, allowing for selective flushing of the delivery lines.
The slurry dispensing system consists of a first supply station, a second supply station, and two loops that are selectively connected to these stations. It includes valves that control the flow of slurry to points of use. This system allows for efficient slurry supply from both stations, optimizing the dispensing process.
Career Highlights
Paul Tan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing the technology used in the industry.
Collaborations
Tan has collaborated with notable colleagues such as Ming-Tzung Hsu and Chiang-Jeh Chen. Their combined expertise has contributed to the successful development of advanced slurry systems.
Conclusion
Paul Tan's contributions to slurry supply and dispensing systems demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the technical challenges faced in chemical mechanical polishing processes.