The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2008

Filed:

Nov. 07, 2006
Applicants:

Ming-tzung Hsu, Hsinchu County, TW;

Paul Tan, Hsinchu, TW;

Chiang-jeh Chen, Hsinchu, TW;

Cho-ching Chen, Hsinchu County, TW;

Hui-ming Chu, Hsinchu, TW;

Inventors:

Ming-Tzung Hsu, Hsinchu County, TW;

Paul Tan, Hsinchu, TW;

Chiang-Jeh Chen, Hsinchu, TW;

Cho-Ching Chen, Hsinchu County, TW;

Hui-Ming Chu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 51/00 (2006.01); F16K 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the first supply station and the second supply station. The first valve connects the first loop to points of use. The second valve connects the second loop to the points of use. When slurry is supplied to the first loop from the first slurry station, slurry is supplied to the second loop from the second slurry station. When the first valve is opened and the second valve is closed, slurry is supplied to the points of use from the first loop.


Find Patent Forward Citations

Loading…