Paul Schilling

Title: The Innovative Contributions of Paul Schilling

Introduction

Paul Schilling is a notable inventor based in Granite Bay, California. He has made significant contributions to the field of microelectronics, holding a total of 10 patents. His work focuses on improving processes related to microelectronic devices, particularly in the areas of cleaning and passivating materials.

Latest Patents

One of Schilling's latest patents is a method of treating a composite spin-on glass/anti-reflective material prior to cleaning. This method involves providing a substrate with a patterned SOG/anti-reflective material, curing it, and then performing a cleaning process to remove the cured material. Another significant patent is related to the passivation of low dielectric materials in wafer processing. This method utilizes a supercritical carbon dioxide passivating solution that includes a silylating agent, such as hexamethyldisilazane (HMDS) and chlorotrimethylsilane (TMCS). The process is conducted under specific temperature and pressure conditions to ensure effective passivation.

Career Highlights

Throughout his career, Paul Schilling has worked with prominent companies in the industry, including Tokyo Electron Limited and Honeywell International Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in microelectronics.

Collaborations

Schilling has collaborated with several professionals in his field, including Maximilian Albert Biberger and Chantal J Arena-Foster. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.

Conclusion

Paul Schilling's contributions to microelectronics through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of cleaning and passivation processes in microelectronic devices.