The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Feb. 14, 2003
Chantal J. Arena-foster, Mesa, AZ (US);
Allan Wendell Awtrey, Forth Worth, TX (US);
Nicholas Alan Ryza, Austin, TX (US);
Paul Schilling, Granite Bay, CA (US);
Chantal J. Arena-Foster, Mesa, AZ (US);
Allan Wendell Awtrey, Forth Worth, TX (US);
Nicholas Alan Ryza, Austin, TX (US);
Paul Schilling, Granite Bay, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.