Location History:
- Hopewell Junction, NY (US) (2002 - 2003)
- Poughkeepsie, NY (US) (2006 - 2014)
Company Filing History:
Years Active: 2002-2014
Title: Innovations of Paul Michael Kozlowski
Introduction
Paul Michael Kozlowski is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of technology, holding a total of five patents. His work primarily focuses on advancements in thin film technology and germanium-based devices.
Latest Patents
Kozlowski's latest patents include innovative methods for the deposition of hydrogenated thin films. This process involves forming a hydrogenated thin film in a controlled vacuum on a substrate by evaporating solid materials and introducing a hydrogen-containing gas. The design includes electrodes with openings that allow vapor entry, and plasma generation within the space promotes the necessary reactions. Another significant patent involves the creation of a thin germanium oxynitride gate dielectric for germanium-based devices. This method produces a germanium oxynitride layer with an equivalent oxide thickness of less than 6 nm. The process consists of two steps: incorporating nitrogen into the surface layer of the Ge-based material, followed by an oxidation step. This technique ensures excellent thickness control and high-quality gate dielectrics for Ge-based field effect devices, such as MOS transistors.
Career Highlights
Kozlowski is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work has had a significant impact on the advancement of semiconductor technologies and materials science.
Collaborations
Throughout his career, Kozlowski has collaborated with notable colleagues, including Cyril Cabral, Jr. and Roy Arthur Carruthers. These collaborations have contributed to the success of his projects and the development of cutting-edge technologies.
Conclusion
Paul Michael Kozlowski is a distinguished inventor whose work in thin film technology and germanium-based devices has led to significant advancements in the field. His contributions continue to influence the technology landscape, showcasing the importance of innovation in driving progress.