The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Dec. 17, 2010
Osama Tobail, Elmsford, NY (US);
Ahmed Abou-kandil, Elmsford, NY (US);
Mostafa M. El-ashry, Elmsford, NY (US);
Jeehwan Kim, Los Angeles, CA (US);
Paul M. Kozlowski, Poughkeepsie, NY (US);
Mohamed Saad, New York, NY (US);
Devendra K. Sadana, Pleasantville, NY (US);
Osama Tobail, Elmsford, NY (US);
Ahmed Abou-Kandil, Elmsford, NY (US);
Mostafa M. El-Ashry, Elmsford, NY (US);
Jeehwan Kim, Los Angeles, CA (US);
Paul M. Kozlowski, Poughkeepsie, NY (US);
Mohamed Saad, New York, NY (US);
Devendra K. Sadana, Pleasantville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A hydrogenated thin film is formed in a controlled vacuum on a substrate by evaporating one or more solid materials and passing the resulting vapor and a hydrogen-containing gas into a space between two electrodes. One of the electrodes includes openings for allowing the vapor to enter the space. Plasma is generated within the space to cause dissociation of the hydrogen-containing gas and promote a reaction between the material(s) and hydrogen-containing gas.