Paul M Fahey

Title: The Innovations of Paul M. Fahey

Introduction

Paul M. Fahey is a notable inventor based in Pleasantville, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on methods that enhance the performance and efficiency of integrated circuits.

Latest Patents

One of Fahey's latest patents is titled "Shallow trench isolation with thin nitride liner." This invention addresses the issue of recessing the nitride liner that previously led to unacceptable voids in the trench filler material. By utilizing a liner thickness of less than 5 nm and incorporating a densification step of a pyrogenic oxide anneal at 800°C, this method not only drives out impurities but also achieves the same density as a conventional argon anneal at 1000°C, significantly reducing thermal load.

Another significant patent is "Highly doped semiconductor material and method of fabrication thereof." This method allows for diffusion doping of semiconductor chips and wafers, particularly silicon, at peak concentrations exceeding about 3×10^19 atoms/cm^3. The process involves placing the semiconducting material in a furnace with a specific atmosphere of carrier gas and dopant gas, enabling direct doping of a silicon surface to form a shallow n-doped region without damaging the silicon surface, which is a common issue with ion implantation.

Career Highlights

Paul M. Fahey is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in semiconductor technology has positioned him as a key player in the development of advanced materials and methods that enhance the functionality of electronic devices.

Collaborations

Throughout his career, Fahey has collaborated with esteemed colleagues such as Erwin Hammerl and Herbert Lei Ho. These collaborations have further enriched his work and contributed to the advancement of semiconductor technologies.

Conclusion

Paul M. Fahey's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his significant role in advancing integrated circuit design and fabrication methods. His work continues to influence the industry and pave the way for future innovations.