The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1995
Filed:
Jun. 29, 1994
Applicant:
Inventors:
Paul M Fahey, Saratoga, CA (US);
Erwin Hammerl, Stormville, NY (US);
Herbert L Ho, Washingtonville, NY (US);
Mutsuo Morikado, Fishkill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437067 ; 437 63 ; 437978 ; 148D / ;
Abstract
A method of forming shallow trench isolation with a nitride liner layer for devices in integrated circuits solves a problem of recessing the nitride liner that led to unacceptable voids in the trench filler material by using a liner thickness of less than 5 nm. A densification step of a pyrogenic oxide anneal at 800.degree. C. not only drives out impurities and achieves the same density as a conventional argon anneal at 1000.degree. C., but also drastically reduces the thermal load.