Paul M Bischoff

Title: The Innovations of Paul M. Bischoff

Introduction

Paul M. Bischoff is a notable inventor based in Livermore, California. He has made significant contributions to the field of lithographic processing, particularly in the area of reconstituted wafers. His innovative approach has led to advancements that support the manufacturing of integrated circuit (IC) chips.

Latest Patents

One of Bischoff's key patents is titled "Scanning methods for focus control for lithographic processing of reconstituted wafers." This patent describes a method of processing a reconstituted wafer that supports IC chips. The method involves operably disposing the reconstituted wafer in a lithography tool that has a defined depth of focus and focus plane. It also includes scanning the reconstituted wafer with a line scanner to measure its surface topography. For each exposure field, the method adjusts the position and/or orientation of the reconstituted wafer to ensure that the photoresist layers of the IC chips fall within the depth of focus, followed by performing an exposure with the lithography tool.

Career Highlights

Paul M. Bischoff is currently employed at Ultratech, Inc., where he continues to develop innovative solutions in lithography. His work has been instrumental in enhancing the efficiency and accuracy of wafer processing techniques. With a total of 1 patent, he has established himself as a valuable contributor to the field.

Collaborations

Throughout his career, Bischoff has collaborated with talented individuals such as Emily M. True and Raymond Ellis. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Paul M. Bischoff's contributions to lithographic processing and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the development of integrated circuit manufacturing processes.