Dublin, Ireland

Paul Heynen

This inventor holds 1 USPTO granted patent. Top assignee: Scientific Systems Research Limited. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Heynen. Retrieved from https://idiyas.com/inventor/paul-heynen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 105(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Paul Heynen - Innovator in Plasma Measurement Technology.

Introduction

Paul Heynen is a notable inventor based in Dublin, Ireland. He has made significant contributions to the field of plasma measurement technology. His innovative work has led to the development of a unique patent that enhances the understanding of plasma characteristics.

Latest Patents

Paul Heynen holds a patent for a Radio Frequency Langmuir Probe. This invention is designed for measuring the characteristics of a plasma driven by radio frequency (RF) power. The probe features an elongated conductor with an exposed tip for insertion into an RF plasma and an outer end for connection to external measuring circuitry. To minimize distortion over a range of RF frequencies, the probe incorporates an RF voltage divider in series between the tip and the outer end of the conductor. This advancement is crucial for accurate plasma measurements.

Career Highlights

Paul Heynen is associated with Scientific Systems Research Limited, where he applies his expertise in plasma technology. His work at the company has been instrumental in advancing research and development in this specialized field.

Collaborations

Paul collaborates with Michael Hopkins, contributing to innovative projects and research initiatives. Their partnership enhances the potential for breakthroughs in plasma measurement technologies.

Conclusion

Paul Heynen's contributions to the field of plasma measurement through his innovative patent demonstrate his commitment to advancing scientific understanding. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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