Orange, CT, United States of America

Paul Figura

USPTO Granted Patents = 6 


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2007-2022

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6 patents (USPTO):

Title: Paul Figura: Innovator in Microelectronics

Introduction

Paul Figura is a notable inventor based in Orange, Connecticut, with a focus on advancements in microelectronics. He holds a total of six patents, showcasing his expertise and contributions to the field. His work primarily revolves around copper electrodeposition techniques that are crucial for the manufacturing of microelectronic devices.

Latest Patents

Among his latest patents, Figura has developed a method for copper electrodeposition in microelectronics. This innovative electrolytic plating method involves a composition that includes a source of copper ions and a suppressor compound with polyether groups. The method emphasizes superfilling through rapid bottom-up deposition, allowing for greater copper deposition in a vertical direction from the bottoms of features to the top openings. Another significant patent involves an electrolytic solution containing a source of copper ions and a quaternized pyridinium salt compound, which aids in leveling during the electroplating process.

Career Highlights

Throughout his career, Paul Figura has worked with prominent companies in the industry, including Enthone Incorporated and Macdermid Enthone GmbH. His experience in these organizations has contributed to his development of innovative solutions in microelectronics.

Collaborations

Figura has collaborated with several professionals in his field, including Vincent Paneccasio, Jr. and Xuan Lin. These collaborations have likely enhanced his research and development efforts, leading to significant advancements in his patented technologies.

Conclusion

Paul Figura's contributions to microelectronics through his patents and career achievements highlight his role as an influential inventor in the industry. His innovative methods for copper electrodeposition continue to impact the manufacturing processes of microelectronic devices.

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