The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2022

Filed:

Jul. 08, 2018
Applicant:

Macdermid Enthone Inc., Waterbury, CT (US);

Inventors:

Vincent Paneccasio, Jr., Madison, CT (US);

Xuan Lin, Northford, CT (US);

Paul Figura, Orange, CT (US);

Richard Hurtubise, Clinton, CT (US);

Assignee:

MacDermid Enthone Inc., Waterbury, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2005.12); H01L 21/288 (2005.12); C25D 3/38 (2005.12); C25D 7/12 (2005.12); H01L 21/768 (2005.12);
U.S. Cl.
CPC ...
H01L 21/2885 (2012.12); C25D 3/38 (2012.12); C25D 7/12 (2012.12); H01L 21/76877 (2012.12); C25D 7/123 (2012.12);
Abstract

An electrolytic plating method and composition for electrolytically plating Cu onto a semiconductor integrated circuit substrate having submicron-sized interconnect features. The composition comprises a source of Cu ions and a suppressor compound comprising polyether groups. The method involves superfilling by rapid bottom-up deposition at a superfill speed by which Cu deposition in a vertical direction from the bottoms of the features to the top openings of the features is substantially greater than Cu deposition on the side walls.


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