Brighton, United Kingdom

Paul Fewster

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Panalytical B.v.. Active years: 2004-2013.


% Patents Active = 50.0

 

Average Co-Inventor Count = 1.3

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2004-2013

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4 patents (USPTO):Explore Patents

Title: The Innovations of Paul Fewster

Introduction

Paul Fewster is a notable inventor based in Brighton, GB. He has made significant contributions to the field of X-ray diffraction technology. With a total of 4 patents to his name, Fewster has demonstrated a commitment to advancing scientific instrumentation.

Latest Patents

Among his latest innovations is the "Diffractometer," which features a compact design with one or more detectors positioned no more than 300 mm from a sample stage. This design allows for high-resolution measurements despite the small dimensions, utilizing a geometry that ensures suitable divergence of X-rays and a small spot size through a grazing exit condition on a monochromator crystal. Another significant patent is the "X-ray diffraction apparatus and method," which includes a source of X-rays and a slit to direct a collimated beam onto a sample. This apparatus records the intensity of diffracted X-rays as a function of position, achieving high resolution without the need for a monochromator.

Career Highlights

Paul Fewster is currently associated with Panalytical B.V., where he continues to innovate in the field of X-ray technology. His work has been instrumental in enhancing the capabilities of diffraction apparatus, making them more efficient and effective for various applications.

Collaborations

Fewster has collaborated with notable colleagues, including Gareth A. Tye and Norman L. Andrew, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Paul Fewster's contributions to X-ray diffraction technology exemplify his dedication to innovation and scientific advancement. His patents reflect a deep understanding of the complexities involved in creating high-resolution measurement tools.

Profile summary based on public USPTO records.
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