Sunnyvale, CA, United States of America

Paul E Luscher


Average Co-Inventor Count = 4.0

ph-index = 16

Forward Citations = 883(Granted Patents)


Company Filing History:


Years Active: 1980-2006

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27 patents (USPTO):

Title: Innovations and Contributions of Paul E Luscher

Introduction: Paul E Luscher, based in Sunnyvale, CA, is a prominent inventor with a remarkable portfolio of 27 patents. His work primarily focuses on advancements in substrate processing systems, contributing significantly to the field of plasma processing.

Latest Patents: Among his notable innovations are the "Double slit-valve doors for plasma processing" and a "Temperature controlled window with a fluid supply system". The double slit-valve doors invention introduces a second inner slit passage door apparatus designed to prevent process byproducts from contaminating the inner surfaces of the chamber. This innovative door enhances plasma uniformity by eliminating large cavities that could disrupt the plasma during processing. Additionally, it is engineered to minimize particle generation, ensuring cleaner operations within the chamber.

The temperature controlled window invention offers an energy-transparent window that integrates a fluid supply system to regulate the temperature during substrate processing. This invention allows precise control over etching processes and the capability to channel temperature-controlling fluids within bonded plates, enhancing efficiency and reliability in processing environments.

Career Highlights: Paul E Luscher has made significant contributions through his extensive career in well-respected companies such as Applied Materials, Inc. His engineering expertise has played a critical role in developing innovative solutions that address complex processing challenges in the semiconductor industry.

Collaborations: Throughout his career, Paul has worked alongside notable colleagues like Michael D Welch and Siamak Salimian. These collaborations have undoubtedly contributed to the advancement of technology and the successful implementation of new ideas in the industry.

Conclusion: Paul E Luscher’s innovative spirit and commitment to enhancing substrate processing systems have made him a key figure in the field of plasma processing. Through his numerous patents and collaborative efforts, he continues to drive technological advancements, providing valuable solutions that meet the industry's evolving needs. His work not only showcases his inventiveness but also sets a benchmark for future innovations in the field.

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