The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Oct. 31, 2001
Paul E. Luscher, Sunnyvale, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Siamak Salimian, Sunnyvale, CA (US);
Michael D. Welch, Pleasanton, CA (US);
Paul E. Luscher, Sunnyvale, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Siamak Salimian, Sunnyvale, CA (US);
Michael D. Welch, Pleasanton, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.