This inventor holds 2 USPTO granted patents and 5 published patent applications and 1 EPO patent. Top assignee: Illumina Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovations of Patrick Wen
Introduction
Patrick Wen is an accomplished inventor based in Encinitas, California. He has made significant contributions to the field of imaging systems, particularly in focus quality metrics and focus tracking technologies. With a total of 2 patents to his name, Wen continues to push the boundaries of innovation in his field.
Latest Patents
Wen's latest patents include "Sequencer focus quality metrics" and "Spot error handling for focus tracking." The first patent describes a method for generating and using a focus quality metric that is intensity independent. This is achieved by acquiring an image of a patterned surface, such as that of a flow cell, and processing it to generate a Fourier transform of the image data. In one embodiment, a discrete Fourier transform is applied to a sub-region of the image, allowing for the derivation of a focus quality metric that is not affected by intensity variations.
The second patent focuses on an imaging system that includes one or more image sensors and a Z-stage. This system is designed to capture images of projected spots at a sample location and determine the validity of these images. When an image is deemed valid, the system measures the current separation distance of the spots and adjusts the Z-stage accordingly to ensure proper focus at the sample location.
Career Highlights
Patrick Wen is currently employed at Illumina Corporation, a leading company in the field of genomics and biotechnology. His work at Illumina has allowed him to develop innovative solutions that enhance imaging systems and improve focus tracking capabilities.
Collaborations
Wen collaborates with talented individuals such as Kevin Early and Gregory L Holst. Their combined expertise contributes to the advancement of technologies in imaging and focus quality metrics.
Conclusion
Patrick Wen's contributions to the field of imaging systems through his patents and work at Illumina Corporation highlight his role as a significant innovator. His focus on developing intensity-independent metrics and advanced focus tracking systems showcases his commitment to enhancing technological capabilities.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile