Patrick Moos

Title: The Innovations of Patrick Moos

Introduction

Patrick Moos is a notable inventor based in Pleiskirchen, Germany. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit.

Latest Patents

His latest patents include a "Device for handling a semiconductor wafer in an epitaxy reactor" and a "Method for producing a semiconductor wafer having an epitaxial layer." The device features a susceptor with longitudinal holes, a wafer lifting shaft, and lifting pins that facilitate the handling of semiconductor wafers in an epitaxy reactor. The method involves placing a substrate wafer onto a susceptor in a deposition chamber to produce semiconductor wafers with an epitaxial layer.

Career Highlights

Patrick Moos is currently employed at Siltronic AG, a leading company in the semiconductor industry. His work focuses on advancing technologies that enhance the production and handling of semiconductor materials.

Collaborations

Throughout his career, Patrick has collaborated with esteemed colleagues such as Hannes Hecht and Reinhard Schauer, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion

Patrick Moos exemplifies the spirit of innovation in the semiconductor field through his patents and contributions at Siltronic AG. His work continues to influence the industry and pave the way for future advancements.