Patrick M Troccolo is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of lens imaging systems and photolithography techniques. With a total of five patents to his name, Troccolo's work has advanced the capabilities of imaging technology.

Latest Patents

Troccolo's latest patents include a method for monitoring the focus of a lens imaging system based on astigmatism. This innovative method allows for the determination of the focus position of a lens system, which can be crucial for ensuring image clarity. Additionally, he has developed a multiple reduction photolithography technique. This technique enables the creation of very small line dimensions by utilizing a two-step exposure process, allowing for intricate patterns to be fabricated on a substrate.

Career Highlights

Troccolo is currently employed at Intel Corporation, where he continues to push the boundaries of technology. His work at Intel has positioned him as a key player in the development of advanced imaging and photolithography methods.

Collaborations

Throughout his career, Troccolo has collaborated with esteemed colleagues such as Charles R Scott and Yan A Borodovsky. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Patrick M Troccolo's innovative contributions to lens imaging systems and photolithography techniques highlight his importance in the field of technology. His patents reflect a commitment to advancing imaging capabilities and precision in manufacturing processes.

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