The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2000
Filed:
Jun. 30, 1998
Yan Borodovsky, Portland, OR (US);
Patrick M Troccolo, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A technique for improving across field dimensional control in a microlithography tool. In a lithography imaging process in which a pattern on a mask is projected to form latent images in a photosensitive medium, the critical dimension distribution across the imaging field varies due to scattering and other factors. An optical compensator having gradient neutral density filter properties is used to reduce the intensity of light at those locations corresponding to regions of an imaging field having higher exposure dose. By reducing the intensity of light at the higher dose regions, the overall dose profile is made more uniform, which reduces linewidth variations when devices are fabricated on an semiconductor wafer.