Patrick M Cowan

Title: Patrick M Cowan: Innovator in Ion Implantation Technologies

Introduction

Patrick M Cowan is a notable inventor based in Pflugerville, TX (US). He has made significant contributions to the field of ion implantation processes, holding a total of 4 patents. His work focuses on enhancing the efficiency and reliability of ion implant tools, which are crucial in semiconductor manufacturing.

Latest Patents

Cowan's latest patents include innovative methodologies for fault detection and control in ion implantation processes. One of his inventions is directed towards fault detection and control methodologies for ion implant processes, which involves performing a tuning process for an ion implant tool. This tuning process results in at least one tool parameter, which is then used to select or create a fault detection model for monitoring the ion implant process. Another significant patent involves process control based on an estimated process result, where trace data from the processing tool is utilized to estimate the outcome of the workpiece processing. This method allows for adjustments in the processing of subsequent workpieces based on the estimated results.

Career Highlights

Cowan is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Throughout his career, Cowan has collaborated with several talented individuals, including Elfido Coss, Jr and Richard J Markle. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Patrick M Cowan is a distinguished inventor whose work in ion implantation technologies has made a significant impact on the semiconductor industry. His innovative patents and contributions continue to shape the future of this critical field.