Laaber, Germany

Patrick Hanekamp

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Infineon Technologies Ag. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Hanekamp. Retrieved from https://idiyas.com/inventor/patrick-hanekamp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Patrick Hanekamp

Introduction

Patrick Hanekamp is a notable inventor based in Laaber, Germany. He has made significant contributions to the field of semiconductor technology. His work focuses on developing advanced semiconductor devices that enhance performance and reliability.

Latest Patents

Patrick holds a patent for a semiconductor device. This invention includes a device region and an edge termination region that surrounds it. The design features a first metal component in the edge termination region, along with a conformal ion diffusion barrier layer and a chemical protection layer. This innovative approach aims to improve the functionality and durability of semiconductor devices.

Career Highlights

Patrick is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His role involves researching and developing cutting-edge technologies that drive the industry forward. With a focus on innovation, he has successfully contributed to the advancement of semiconductor applications.

Collaborations

Throughout his career, Patrick has collaborated with talented professionals, including Carsten Schaeffer and Oliver Humbel. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Patrick Hanekamp's work in semiconductor technology exemplifies the spirit of innovation. His contributions continue to shape the future of the industry, making a lasting impact on technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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