This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Patricia Connell: Innovator in CMP Polishing Technology
Introduction
Patricia Connell is a notable inventor based in Rising Sun, MD (US), recognized for her contributions to the field of semiconductor and optical materials. With a focus on enhancing the efficiency of polishing processes, she has made significant strides in innovation.
Latest Patents
Connell holds a patent for a "Debris-removal groove for CMP polishing pad." This invention provides a polishing pad suitable for polishing or planarizing semiconductor, optical, and magnetic substrates. The polishing pad features a polymeric matrix and a polishing track that represents the working region. Radial drainage grooves extend through the polishing track, facilitating the removal of polishing debris during the rotation of the pad.
Career Highlights
Patricia Connell has made a mark in her career by working with Rohm and Haas Electronic Materials CMP Holdings, Inc. Her expertise in the field has led to advancements in polishing technology, which are crucial for the manufacturing of high-quality electronic components.
Collaborations
Connell has collaborated with notable colleagues, including Lee Melbourne Cook and Yuhua Tong, contributing to a dynamic work environment that fosters innovation and development.
Conclusion
Patricia Connell's work in CMP polishing technology exemplifies her commitment to innovation in the semiconductor industry. Her patent and career achievements highlight her role as a leading inventor in this specialized field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile