Draveil, France

Pascal Bouard



Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 61(Granted Patents)


Location History:

  • Draveil, FR (1995 - 1996)
  • Fontenay Le Fleury, FR (1996 - 1999)

Company Filing History:


Years Active: 1995-1999

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7 patents (USPTO):Explore Patents

Title: The Innovations of Pascal Bouard

Introduction

Pascal Bouard is a notable inventor based in Draveil, France. He has made significant contributions to the field of materials science, particularly in the development of silicon oxide coatings. With a total of 7 patents to his name, Bouard's work has advanced the technology surrounding substrate coatings.

Latest Patents

Among his latest patents is a method for creating a product substrate coated with a uniform deposit of silicon oxide. This innovative process involves subjecting the substrate to an electrical discharge with a dielectric barrier in a controlled atmosphere containing silane and an oxidizing gas. The atmosphere is maintained at a pressure higher than 10,000 Pa, ensuring that any unwanted oxygen is prevented from entering the region where the discharge occurs. Another significant patent is a device designed for creating a deposit of silicon oxide on a traveling solid substrate, utilizing similar principles to ensure a consistent and high-quality coating.

Career Highlights

Throughout his career, Pascal Bouard has worked with several prominent companies, including L'Air Liquide, Société Anonyme Pour L'Étude Et L'Exploitation Des, and Softal Electronic GmbH. His experience in these organizations has allowed him to refine his expertise in the field of materials science and innovation.

Collaborations

Pascal Bouard has collaborated with notable professionals in his field, including Frank Slootman and Francedillaois Coeuret. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Pascal Bouard's contributions to the field of silicon oxide coatings demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving substrate coating processes, making him a significant figure in materials science.

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