The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 1998

Filed:

May. 23, 1995
Applicant:
Inventors:

Frank Slootman, Saint Cyr l'Ecole, FR;

Pascal Bouard, Fontenay le Fleury, FR;

Francedilla.ois Coeuret, Guyancourt, FR;

Dominique Jouvaud, Paris, FR;

Eckhard Prinz, Hamfelde, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
42218626 ; 42218623 ; 42218605 ; 422907 ;
Abstract

A device for creating a deposit of silicon oxide on a traveling solid substrate, wherein the substrate is subjected to an electrical discharge with a dielectric barrier in the presence of a controlled atmosphere containing a silane and an oxidizing gas, the atmosphere being at a pressure higher than 10,000 Pa, and wherein the atmosphere is maintained in the immediate vicinity of an electrode in the region where the electrical discharge is produced and further wherein any entrainment of oxygen other than that forming part of the atmosphere in the region is prevented.


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