Location History:
- Cassaro, IT (1992)
- Cassaro Sr, IT (1992 - 1994)
Company Filing History:
Years Active: 1992-1994
Title: Paolo Lanza: Innovator in Semiconductor Metallization
Introduction
Paolo Lanza is a notable inventor based in Cassaro Sr, Italy. He has made significant contributions to the field of semiconductor technology, particularly in the area of metallization processes. With a total of 4 patents to his name, Lanza's work has had a considerable impact on the industry.
Latest Patents
Lanza's latest patents include a process for obtaining multi-layer metallization of the back of a semiconductor substrate. This innovative method involves depositing a series of metal layers after ion implantation of dopants on the interface with the first layer. The process is followed by thermal annealing under vacuum or in an inert atmosphere, at a temperature considerably lower than 500°C and for a period considerably shorter than 60 minutes. Another significant patent is the metal-semiconductor ohmic contact forming process. This process consists of enriching the surface of the semiconductor by ion implantation of a dopant, followed by the deposition of a metal film on the implanted surface and thermal annealing at a temperature lower than 500°C for a period shorter than 60 minutes.
Career Highlights
Paolo Lanza is currently employed at SGS-Thomson Microelectronics S.r.l., where he continues to develop innovative solutions in semiconductor technology. His expertise and dedication to research have positioned him as a key figure in his field.
Collaborations
Lanza has collaborated with several talented individuals, including Carmelo Magro and Antonello Santangelo. These partnerships have fostered a creative environment that encourages innovation and the advancement of technology.
Conclusion
Paolo Lanza's contributions to semiconductor metallization processes highlight his role as a leading inventor in the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.