Pang-Dow Foo

Title: The Innovative Contributions of Pang-Dow Foo

Introduction

Pang-Dow Foo is a notable inventor based in Berkeley Heights, NJ (US), recognized for his significant contributions to the field of semiconductor device fabrication. With a total of six patents to his name, Foo has made remarkable advancements that have implications for the technology industry.

Latest Patents

One of Foo's latest patents is titled "Low temperature deposition of silicon oxides for device fabrication." This innovative process utilizes a deposition method involving a plasma struck in a gas that includes tetraethoxysilane and a source of oxygen. The result is conformal coatings of silicon dioxide achieved at low temperatures, which is crucial for semiconductor device fabrication, particularly when depositing a dielectric over a metallic non-planar structure. Another significant patent is the "Process for fabricating integrated circuits." This patent describes a method that significantly improves integrated circuits employing titanium nitride. By using a specific technique for the formation of titanium nitride, which involves a plasma formed in an electron cyclotron resonance apparatus, the process effectively dissociates a source of nitrogen and a source of hydrogen. The resulting deposition is devoid of chlorine and exhibits advantageous step-coverage properties.

Career Highlights

Throughout his career, Pang-Dow Foo has worked with prestigious organizations such as AT&T Bell Laboratories and Lucent Technologies Inc. His work in these companies has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Foo has collaborated with esteemed colleagues, including Chien-Shing Pai and Ajit S Manocha, contributing to the advancement of technology through shared expertise and innovative ideas.

Conclusion

Pang-Dow Foo's contributions to the field of semiconductor device fabrication through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the technology industry and pave the way for future innovations.