The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 1989

Filed:

Feb. 10, 1988
Applicant:
Inventors:

Frank B Alexander, Jr, Totowa, NJ (US);

Pang-Dow Foo, Berkeley Heights, NJ (US);

Ronald J Schutz, Warren, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156345 ; 20419232 ; 204298 ;
Abstract

By adjusting the AC field conditions, i.e., by grounding the environment of a substrate being etched with a chlorine-containing plasma, a significant increase in etch selectivity is achieved. By applying a similar AC field adjustment to the reaction chamber surfaces, excellent etch uniformity is achieved in conjunction with excellent selectivity.


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