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For the Inventor, By the Inventor

Boise, ID, United States of America

Pai-Hung Pan

USPTO Granted Patents = 94

Average Co-Inventor Count = 2.3

ph-index = 23

Forward Citations = 1,520(Granted Patents)

Forward Citations (Not Self Cited) = 1,474(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Essex Junction, VT (US) (1986 - 1988)
  • Hopewell Junction, NY (US) (1994 - 1995)
  • Boise, ID (US) (1996 - 2014)

Company Filing History:

goldMedal85 out of 37,972 
 
Micron Technology Incorporated
 patents
silverMedal9 out of 164,197 
 
International Business Machines Corporation
 patents

Years Active: 1986-2014

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Areas of Expertise:
Semiconductor Devices
Isolation Structures
Ion-Assisted Oxidation
Microelectronic Components
Gate Stack Formation
Memory Circuitry
Doped Silicon Barrier
Conductive Gate Formation
Dynamic Random Access Memory
Material Removal Techniques
Shallow Trench Isolation
Integrated Circuitry
94 patents (USPTO):Explore Patents
1. 8790982 - Methods for reoxidizing an oxide and for fabricating semiconductor devices (2014-07-29),
2. 8637956 - Semiconductor devices structures including an isolation structure (2014-01-28),
3. 8492851 - Structures including an at least partially reoxidized oxide material (2013-07-23),
4. 8338264 - Methods for forming isolation structures for semiconductor devices (2012-12-25),
5. 7371697 - Ion-assisted oxidation methods and the resulting structures (2008-05-13),
6. 7170139 - Semiconductor constructions (2007-01-30),
7. 7132035 - Methods, apparatuses, and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes (2006-11-07),
8. 7119033 - Ion-assisted oxidation methods and the resulting structures (2006-10-10),
9. 7115492 - Technique for elimination of pitting on silicon substrate during gate stack etch using material in a non-annealed state (2006-10-03),
10. 7078342 - Method of forming a gate stack (2006-07-18),
11. 7049664 - Semiconductor device structures formed by ion-assisted oxidation (2006-05-23),
12. 7041548 - Methods of forming a gate stack that is void of silicon clusters within a metallic silicide film thereof (2006-05-09),
13. 6936897 - Intermediate structure having a silicon barrier layer encapsulating a semiconductor substrate (2005-08-30),
14. 6844252 - Semiconductor processing methods of forming a conductive gate and line (2005-01-18),
15. 6770538 - Ion-assisted oxidation methods and the resulting structures (2004-08-03),

Title: Pai-Hung Pan: Pushing Boundaries in Semiconductor Technology

Introduction: Pai-Hung Pan, a visionary inventor based in Boise, ID (US), has made a significant impact on the world of technology with his innovative approach to semiconductor devices. With an impressive 94 patents to his name, Pan is a driving force behind cutting-edge advancements that shape our daily lives.

Latest Patents: Pan's latest patents showcase his expertise in oxidation methods and semiconductor device fabrication. He has developed novel techniques for reoxidizing oxide layers on substrates using vertical ion bombardment, enhancing the efficiency and performance of semiconductor devices. Additionally, his work on shallow isolation trench structures has revolutionized the isolation process, leading to the creation of more robust semiconductor components.

Career Highlights: Throughout his career, Pan has worked with esteemed companies such as Micron Technology Incorporated and IBM (International Business Machines Corporation), where he honed his skills and contributed to groundbreaking projects. His dedication to pushing the boundaries of technology has earned him recognition as a key figure in the semiconductor industry.

Collaborations: Pan has collaborated with talented individuals in the field, including Kirk D Prall and Li Li, to bring his innovative ideas to fruition. Through teamwork and shared expertise, Pan and his coworkers have achieved remarkable success in advancing semiconductor technology and driving industry progress.

Conclusion: Pai-Hung Pan's relentless pursuit of innovation and his trailblazing work in semiconductor technology make him a standout figure in the world of inventions. His patents and contributions serve as a testament to his ingenuity and drive to push technological boundaries, inspiring future generations of inventors to follow in his footsteps.

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