Location History:
- Miyagi, JP (1996)
- Sendai, JP (1989 - 2000)
- Miyogi-ken, JP (2005)
- Miyagi-ken, JP (1996 - 2010)
Company Filing History:
Years Active: 1989-2010
Title: Osamu Uchisawa: Innovator in MOCVD Technology
Introduction
Osamu Uchisawa is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of chemical vapor deposition, particularly in metal-organic chemical vapor deposition (MOCVD) technology. With a total of 14 patents to his name, Uchisawa has established himself as a key figure in the development of advanced vaporization techniques.
Latest Patents
One of Uchisawa's latest patents is a vaporizer for MOCVD and a method of vaporizing raw material solutions for MOCVD. This innovative vaporizer consists of a dispersing section and a vaporizing section. The dispersing section includes a gas introduction port for introducing a carrier gas under pressure into a gas passage, along with means for feeding raw material solutions to the gas passage. It also features a gas outlet for delivering the carrier gas containing the raw material solutions to the vaporizing section. The vaporizing section comprises a vaporizing tube that connects to a reaction tube of the MOCVD system and includes heating means for heating the vaporizing tube. This design allows for efficient heating and vaporization of the raw material solution containing carrier gas delivered from the dispersing section.
Career Highlights
Throughout his career, Uchisawa has worked with notable companies such as Kabushiki Kaisha Motoyamaseisakusho and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in MOCVD technology and has facilitated his innovative work in the field.
Collaborations
Uchisawa has collaborated with several professionals in his field, including Mitsuaki Komino and Yohichi Kanno. These collaborations have likely enhanced his research and development efforts, leading to the successful creation of his patented technologies.
Conclusion
Osamu Uchisawa's contributions to MOCVD technology through his innovative patents and collaborations highlight his importance in the field of chemical vapor deposition. His work continues to influence advancements in this area, showcasing the impact of dedicated inventors on technological progress.