Company Filing History:
1 out of 16,453 
1 out of 13,281 Years Active: 2014-2015
Title: Osamu Matsui: Innovator in Semiconductor Technology
Introduction
Osamu Matsui is a notable inventor based in Toyama, Japan, recognized for his contributions to semiconductor technology. With a total of 2 patents, Matsui has made significant advancements in the field, particularly in the design and functionality of semiconductor devices.
Latest Patents
Matsui's latest patents include a semiconductor device that features a channel region with a first conductivity type, strategically placed in the surface portion of a semiconductor substrate. This device also incorporates a gate region with a second conductivity type, enhancing its operational capabilities. Additionally, he has developed a bipolar transistor that includes a diffused layer situated between the deep trench sidewall and the collector diffused layer, showcasing his innovative approach to semiconductor design.
Career Highlights
Throughout his career, Matsui has worked with prominent companies such as Panasonic Corporation and Panasonic Intellectual Property Management Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Matsui has collaborated with esteemed colleagues, including Mitsuo Tanaka and Tsuneichiro Sano, further enriching his work and expanding the impact of his inventions.
Conclusion
Osamu Matsui's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.