This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Suss Microtec Lithography Gmbh. Active years: 2018-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018-2020
Title: Innovations of Inventor Omar Fakhr
Introduction
Omar Fakhr is a notable inventor based in Garching, Germany. He has made significant contributions to the field of coating technologies, particularly in the application and curing of photoresists. With a total of 2 patents, his work has advanced the methods used in substrate coating processes.
Latest Patents
Omar Fakhr's latest patents include a method for coating a substrate and a device for curing photoresists. The first patent describes a method for applying a coating material to a substrate, where a gas flow is generated to prevent the formation of beads on the edges of the substrate. This innovative approach enhances the quality of the coating process. The second patent outlines a method for curing photoresists, which involves rotating the substrate during the curing process to ensure even application and optimal results.
Career Highlights
Omar Fakhr is currently employed at Suss Microtec Lithography GmbH, where he continues to develop and refine his innovative techniques. His expertise in coating technologies has positioned him as a valuable asset in the field of lithography.
Collaborations
Omar has collaborated with notable colleagues, including Dietrich Toennies and Darren Robert Southworth. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Omar Fakhr's contributions to the field of coating technologies through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in substrate coating and photoresist curing methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
