The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Jun. 23, 2017
Applicant:

Suss Microtec Lithography Gmbh, Garching, DE;

Inventors:

Darren Southworth, Garching, DE;

Omar Fakhr, Garching, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); B05D 1/00 (2006.01); G03F 7/16 (2006.01); H01L 21/67 (2006.01); B05D 3/00 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
B05D 1/002 (2013.01); B05D 1/005 (2013.01); B05D 3/007 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/6715 (2013.01); H01L 21/0337 (2013.01);
Abstract

Method for coating a substrate with a coating material is described, in particular with a coating or photoresist, wherein said substrate is provided in said method. Said coating material is applied to said upper side of said substrate. A gas flow is generated, said gas flow being directed from said underside of said substrate to said upper side of said substrate, wherein said gas flow prevents a bead of said coating material forming on said edge of said upper side of said substrate or a previously existing bead is removed by means of said gas flow. In addition, a coating system is described.


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