Oliver Jäckel

Title: Oliver Jäckel: Innovator in Lithography Technology

Introduction

Oliver Jäckel is a notable inventor based in Jena, Germany. He has made significant contributions to the field of lithography, particularly in the development of methods and apparatuses for analyzing and processing masks used in this technology. With a total of 2 patents, Jäckel's work is at the forefront of advancements in lithographic techniques.

Latest Patents

Jäckel's latest patents include a method, apparatus, and computer program for analyzing and/or processing a mask for lithography. This invention focuses on a method that generates at least one particle beam vortex, which is utilized for analyzing and processing masks, especially for EUV lithography. Another significant patent is for a measuring microscope designed for measuring masks used in lithographic methods. This invention includes a calibration method that employs a calibration mask in a self-calibration algorithm to ascertain error correction data, enhancing the accuracy of measurements.

Career Highlights

Oliver Jäckel is associated with Carl Zeiss SMT GmbH, a leading company in optical systems and lithography technology. His work at this esteemed organization has allowed him to push the boundaries of innovation in the field.

Collaborations

Jäckel has collaborated with notable colleagues, including Carola Bläsing-Bangert and Dirk Seidel. These partnerships have contributed to the successful development of his inventions and advancements in lithography.

Conclusion

Oliver Jäckel's contributions to lithography technology through his innovative patents and collaborations highlight his role as a key inventor in this field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.