The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Mar. 17, 2017
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Oliver Jäckel, Jena, DE;

Carola Bläsing-Bangert, Rothenstein, DE;

Dirk Seidel, Jena-Leutra, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G03F 1/84 (2012.01); G01B 11/24 (2006.01); G01N 21/45 (2006.01);
U.S. Cl.
CPC ...
G02B 21/365 (2013.01); G01B 11/2441 (2013.01); G01N 21/45 (2013.01); G03F 1/84 (2013.01); G01N 2021/458 (2013.01);
Abstract

The present invention relates to a method for calibrating a measuring microscope which may be used to measure masks, in which a calibration mask is utilized in a self-calibration algorithm in order to ascertain error correction data of the measuring microscope, wherein, in the self-calibration algorithm, the calibration mask is imaged and measured in various positions in the measuring microscope in order to ascertain one or more portions of the error correction data, wherein the surface profile of the calibration mask is ascertained and utilized when determining the error correction. Moreover, the invention relates to a measuring microscope and a method for operating same.


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