Hod-Hasharon, Israel

Ofer Shneyour


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Hod-Hasharon, IL (2008 - 2017)
  • Tel Aviv-Jaffa, IL (2020)

Company Filing History:


Years Active: 2008-2020

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3 patents (USPTO):Explore Patents

Sure, here is the article about inventor Ofer Shneyour based on the information provided:

Title: Unveiling the Innovations of Ofer Shneyour

Introduction:

Ofer Shneyour, a prolific inventor hailing from Hod-Hasharon, IL, has made significant contributions in the field of advanced imaging and evaluation systems. With a total of 3 patents to his name, Shneyour's groundbreaking work has revolutionized the way regions of objects are assessed and substrates are evaluated.

Latest Patents:

Among his latest patents is a groundbreaking “Method for evaluating a region of an object.” This method involves the utilization of charged particle imaging and milling techniques to generate three-dimensional information about the content of a region. Additionally, Shneyour has developed an “Evaluation system and a method for evaluating a substrate” that incorporates spatial sensors such as atomic force microscopes and solid immersion lenses to achieve precise spatial relationships between elements.

Career Highlights:

Shneyour has honed his expertise while working with renowned companies such as Applied Materials Israel Limited and DSPG Ltd. His innovative spirit and dedication to pushing the boundaries of technology have earned him a reputation as a trailblazer in the industry.

Collaborations:

Throughout his career, Shneyour has collaborated closely with industry experts, including his esteemed coworker, Ron Naftali. Together, they have synergized their talents to develop cutting-edge solutions that are reshaping the landscape of imaging and evaluation technologies.

Conclusion:

In conclusion, Ofer Shneyour stands as a visionary inventor whose passion for innovation has led to the creation of groundbreaking technologies in the realm of object evaluation and substrate assessment. His contributions have not only advanced the field but have also inspired a new generation of inventors to push the boundaries of what is possible in the world of technology.

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