Company Filing History:
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1 out of 1 Years Active: 2024
Title: Ofek Oiknine: Innovator in X-ray Inspection Technology
Introduction
Ofek Oiknine is a notable inventor based in Ramat Yishai, Israel. He has made significant contributions to the field of X-ray inspection technology, holding a total of 2 patents. His work focuses on enhancing the capabilities and efficiency of X-ray inspection systems.
Latest Patents
Ofek Oiknine's latest patents include a Dual Source X-ray Inspection System and Method. This innovative system comprises at least two X-ray sources positioned and oriented at selected angles with respect to an inspection plane. It provides a common illumination spot on the inspection plane, enabling the inspection of common regions of a sample with increased irradiation intensity or varying irradiation characteristics while minimizing navigation and registration processing. Another significant patent is the Dual Head X-ray Inspection System, which describes a sample inspection system featuring at least first and second inspection units positioned above a sample region. Each unit includes at least one X-ray radiation source and a respective detector arrangement, configured for X-ray fluorescent inspection of a sample. The first and second X-ray inspection units offer different inspection properties, including variations in bandwidth of emitted X-ray energies, energy of emitted X-rays, and spot size of the X-ray beam generated on a sample.
Career Highlights
Throughout his career, Ofek Oiknine has worked with Xwinsys Technology Development Ltd. and Xwinsys Technology Developments Ltd. These experiences have allowed him to refine his expertise in X-ray inspection technologies and contribute to advancements in the field.
Collaborations
Ofek has collaborated with notable professionals such as Avishai Shklar and Kiyoshi Ogata. These partnerships have further enriched his work and innovation in X-ray inspection systems.
Conclusion
Ofek Oiknine stands out as an influential inventor in the realm of X-ray inspection technology. His patents reflect a commitment to improving inspection methods and enhancing the capabilities of X-ray systems. His contributions are poised to make a lasting impact in the field.