Obert Reeves Wood, Ii

Title: Obert Reeves Wood, II: Innovator in Extreme Ultraviolet Lithography

Introduction

Obert Reeves Wood, II is a prominent inventor based in Loudonville, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in extreme ultraviolet (EUV) lithography. With a total of 12 patents to his name, Wood has established himself as a key figure in advancing lithography techniques.

Latest Patents

Among his latest patents is the development of an extreme ultraviolet (EUV) lithography mask. This innovation relates to semiconductor structures and includes a reflective layer, a capping material on the reflective layer, a buffer layer, alternating absorber layers, and a capping layer on top of the absorber layers. Another notable patent focuses on extreme ultraviolet mirrors and masks, which are essential in lithography. This patent outlines methods for manufacturing an EUV mirror or mask, detailing the materials and optical properties necessary for optimal reflectivity.

Career Highlights

Obert Wood has worked with leading companies in the semiconductor industry, including Globalfoundries Inc. and Advanced Micro Devices Corporation. His experience in these organizations has allowed him to contribute to cutting-edge technologies and innovations in the field.

Collaborations

Throughout his career, Wood has collaborated with notable professionals such as Lei Sun and Ryoung-han Kim. These collaborations have further enhanced his work and contributions to semiconductor technology.

Conclusion

Obert Reeves Wood, II is a distinguished inventor whose work in extreme ultraviolet lithography has significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology in this critical field.