The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Mar. 08, 2013
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Lei Sun, Albany, NY (US);
Obert Reeves Wood, II, Loudonville, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); G02B 5/02 (2006.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G02B 5/208 (2013.01); G02B 5/22 (2013.01); G02B 5/0242 (2013.01);
Abstract
A scattering enhanced thin absorber for a EUV reticle and a method of making thereof is disclosed. Embodiments include forming a multilayer on the upper surface of a substrate, forming a capping layer over the multilayer, forming one or more diffuse scattering layers over the capping layer, and etching the diffuse scattering layers to form a stack.