Location History:
- Fujisawa, JP (1995)
- Hadano, JP (1998 - 1999)
Company Filing History:
Years Active: 1995-1999
Title: Noriyuki Takeuchi: Innovator in Thin-Film Vapor Deposition Technology
Introduction
Noriyuki Takeuchi is a prominent inventor based in Hadano, Japan. He has made significant contributions to the field of thin-film vapor deposition technology. With a total of 3 patents to his name, Takeuchi has demonstrated his expertise and innovative spirit in this specialized area.
Latest Patents
Takeuchi's latest patents include a thin-film vapor deposition apparatus that features a reaction casing defining a reaction chamber. This apparatus includes a stage for supporting a substrate, which is positioned within the reaction chamber. A shower head is supported on the reaction casing, discharging a material gas toward the substrate to facilitate the deposition of a thin film. Additionally, a plurality of flow path systems are integrated into the shower head and reaction casing, allowing for the passage of a heating medium to control the temperatures of various regions under the guidance of a temperature controller.
Another notable patent is the reactant gas ejector head designed for use in a thin-film vapor deposition apparatus. This invention comprises at least two reactant gas inlet passages for introducing reactant gases. A gas mixing chamber is included for mixing these gases, and a nozzle downstream of the mixing chamber rectifies the mixed gases into a uniform flow, which is then applied to the substrate.
Career Highlights
Noriyuki Takeuchi is associated with Ebara Corporation, a company known for its advanced technology and engineering solutions. His work at Ebara has allowed him to focus on developing innovative solutions in the field of vapor deposition.
Collaborations
Takeuchi has collaborated with notable colleagues, including Takeshi Murakami and Hiroyuki Shinozaki. These collaborations have contributed to the advancement of technology in their respective fields.
Conclusion
Noriyuki Takeuchi's contributions to thin-film vapor deposition technology highlight his innovative capabilities and dedication to advancing engineering solutions. His patents reflect a commitment to improving processes and technologies that are essential in various applications.