The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 1995

Filed:

May. 18, 1993
Applicant:
Inventors:

Noriyuki Takeuchi, Fujisawa, JP;

Masaaki Kajiyama, Fujisawa, JP;

Fumio Kondo, Fujisawa, JP;

Masao Matsumura, Fujisawa, JP;

Takeshi Yoshioka, Fujisawa, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B65B / ;
U.S. Cl.
CPC ...
53432 ; 53 90 ; 53405 ; 53510 ;
Abstract

Several vacuum process steps are applied to substrates such as a wafer using a vacuum container for storing and transporting the substrates under vacuum. The vacuum container comprises a container body having a main opening for inserting a substrate and taking out the substrate, a lid engageable with the container body for closing and sealing the main opening of the container body, and a gate provided on one of the container body and the lid for performing at least one of evacuating an interior of the vacuum container and raising the pressure of the interior of the vacuum container to ambient.


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